4. Conclusion
In this review, we summarized several key aspects of vertical GaN power electronics including material growth, device architectures, device physics, and processing issues. High-performance vertical GaN transistors and diodes have been demonstrated on free-standing GaN substrate and low-cost silicon wafer. With the advances in substrate technology and the optimization of the field engineering, vertical GaN power devices with breakdown voltage beyond 5 kV can be realized. There are however, very limited reliability studies on vertical devices so far. A careful study of the origin of the breakdown mechanism in these devices is also needed. The maturity of the substrate technology together with the optimization of the device processing will soon enable the commercialization of vertical GaN power devices.