دانلود رایگان مقاله پردازش دمای پایین پلاسما برای ساخت غشا های نازک

عنوان فارسی
پردازش دمای پایین پلاسما برای ساخت غشاهای نازک رشد سلول کربن دمیده
عنوان انگلیسی
Low temperature plasma processing for cell growth inspired carbon thin films fabrication
صفحات مقاله فارسی
0
صفحات مقاله انگلیسی
8
سال انتشار
2016
نشریه
الزویر - Elsevier
فرمت مقاله انگلیسی
PDF
کد محصول
E353
رشته های مرتبط با این مقاله
زیست شناسی
گرایش های مرتبط با این مقاله
علوم سلولی مولکولی و بیوشیمی
مجله
آرشیو بیوشیمی و بیوفیزیک - Archives of Biochemistry and Biophysics
دانشگاه
مرکز تحقیقات فناوری نانو پلاسما، دانشگاه ناگویا، ژاپن
کلمات کلیدی
کربن، کشت سلولی، طیف سنجی فوتوالکترون، دمای پایین پلاسما، سلول استخوان
۰.۰ (بدون امتیاز)
امتیاز دهید
چکیده

Abstract


The recent bio-applications (i.e. bio-sensing, tissue engineering and cell proliferation etc.) are driving the fundamental research in carbon based materials with functional perspectives. High stability in carbon based coatings usually demands the high density deposition. However, the standard techniques, used for the large area and high throughput deposition of crystalline carbon films, often require very high temperature processing (typically >800 °C in inert atmosphere). Here, we present a low temperature (<150 °C) pulsed-DC plasma sputtering process, which enables sufficient ion flux to deposit dense unhydrogenated carbon thin films without any need of substrate-bias or post-deposition thermal treatments. It is found that the control over plasma power density and pulsed frequency governs the density and kinetic energy of carbon ions participating during the film growth. Subsequently, it controls the contents of sp3 and sp2 hybridizations via conversion of sp2 to sp3 hybridization by ion's energy relaxation. The role of plasma parameters on the chemical and surface properties are presented and correlated to the bio-activity. Bioactivity tests, carried out in mouse fibroblast L-929 and Sarcoma osteogenic (Saos-2) bone cell lines, demonstrate promising cell-proliferation in these films.

نتیجه گیری

4. Conclusions


Low temperature carbon film fabrication is a processing challenge when one considers its use for large area deposition with high throughput. In present work, we have shown good quality carbon films with pulse DC plasma processing assisted with rotating substrate platform which restricts the substrate temperature well below 150 C. The correlation of plasma parameters to the control of sp3 and sp2 hybridization has been established on the basis of detailed core level study of the films. The role of power density is found to control the plasma density, where as the role of pulse frequency is found to enhance the ionization and kinetic energies of ions/neutrals during the film deposition. These low-temperature processed carbon films show excellent cell-viability for the L-929 mouse fibroblast and Saos-2 bone cells.


بدون دیدگاه